芯片制造工艺问答036：PHO Overlay shift的原因及现象有哪些? 其中有多少种可以经由给机台补偿改善?
Ans (1) phenomenon:translation, rotation and magnitude, trapezoid, tilt (2) reason: as belowtabler 平移 旋转 水平 扭曲 倍率 X, Y large mean, small range
名词解释
芯片制造工艺问答035： Lot to lot, within lot wafer to wafer, within wafer, within field.
Ans (1) lot to lot :不同lot之间的差异性, due to EQ, material, environmental shift(2) within lot waferto wafer:同一个lot中,不同wafer之间的差异性, due to batch run conditional shift. E.g. Lensheating, CVD film thicknes
